Home > Products > Industrial Supplies > Other Industrial Supplies

1.Principle of the Nanometer Dry Ice Semiconductor Cleaning Equipment

Using granular dry ice as the cleaning medium, the dry ice particles are sprayed at high speed onto the surface of the object to be cleaned through compressed air. This freezes the dirt on the surface of the object to be cleaned until it becomes brittle and bursts. The dry ice particles penetrate between the dirt and the base material through the impact force and then sublimate immediately. The volume instantaneously increases by 800 times, forcing the dirt to separate from the base material, thus achieving the purpose of cleaning.

2.Parameters of the Nanometer Dry Ice Semiconductor Cleaning Equipment

Model: Semiconductor Cleaning Machine WMGB01

Overall Dimensions: 450×500×300

Weight: 20Kg

Power Supply: 220V 50Hz Single Phase

Power: 2kW

CO2 Spraying System

CO2 State: Liquid

CO2 Pressure: ≥5.5MPa

Nozzle Specification: 0.1mm~4mm

CO2 Consumption: 50~200g/min

CO2 Constant Temperature System

Medium: -

Capacity: -

Temperature Adjustment Range: -

CO2 Pressure Boosting System

Driving Medium: -

Driving Air Pressure: -

Pressure Boosting Ratio: -

Pressure Boosting Quantity: -

CDA Auxiliary System

CDA Gas: Compressed Air/Nitrogen

CDA Pressure: 0.1~0.8MPa

CDA Temperature Adjustment: Optional