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19
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Non-ferrous Metal
Nickel-Chromium (NiCr) alloy targets use in evaporation or thin
film
coat
ing
US $200
Inquire Now
Vanadium Aluminum (V-Al) alloy targets use in evaporation or thin
film
coat
ing
US $500
Inquire Now
Tantalum, Ta sputtering targets for plaane display thin
film
coat
ing
US $400
Inquire Now
Cobalt Co sputtering targets use in thin
film
coat
ing CAS 7440-48-4
US $100
Inquire Now
Tellurium (Te) targets use in solar cell thin
film
coat
ing CAS 13494-80-9
US $200
Inquire Now
Tungsten (W) metal targets use in Planne display thin
film
coat
ing CAS 7440-33-7
US $200
Inquire Now
Manganese (Mn) sputtering targets use in Glass thin
film
coat
ing CAS: 7439-96-5
US $200
Inquire Now
Niobium (Nb) metal sputtering target use in planner display thin
film
coat
ing
US $200
Inquire Now
Zirconium Zr sputteirng target usd in Decorate thin
film
coat
ing CAS 7440-67-7
US $200
Inquire Now
Calcium Ca sputtering targets use in thin
film
coat
ing CAS 7440-70-2
US $300
Inquire Now
Tungsten (W) metal evaporation material use in thin
film
coat
ing CAS 7440-33-7
US $150
Inquire Now
1
Vanadium V metal sputtering targets CAS 7440-62-2
US $200
Inquire Now
Aluminum (Al) metal evaporation material CAS 7429-90-5
US $200
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Ruthenium (Ru) metal sputtering targets, Purity: 99.95%, CAS: 7440-18-8
US $400
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Boron (B) sputtering targets, Purity: 99.9%, CAS ID: 7440-42-8
US $200
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Bismuth (Bi) metal sputtering targets, purity; 99.99%, CAS: 7440-69-9
US $100
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Indium (In) sputtering targets CAS 7440-74-6
US $200
Inquire Now
Tin (Sn) metal sputtering target, purity: 99.99%, 99.999%, CAS: 7440-31-5
US $100
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Chromium Sputtering Target High Purity Metal Plate for Thin
Film
Coat
ing
US $150
Inquire Now
1
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