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laboratory vacuum PVD 3-target RF magnetron sputtering coater with UPS 1
  • laboratory vacuum PVD 3-target RF magnetron sputtering coater with UPS 1

laboratory vacuum PVD 3-target RF magnetron sputtering coater with UPS

Model:MSP325S-3RF-D
Brand:CYKY
Origin:Made In China
Category:Electronics & Electricity / Electronic Instrument / Laboratory Instrument
Label:magnetron sputtering , vacuum PVD , RF sputtering
Price: -
Min. Order:1 pc
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Member Information

Detail

Zhengzhou CY Scientific Instrument

Free MemberHe Nan - China
Live Chat:Last Online:17 Aug, 2020

Product Description

CY-MSP325S-3RF-D RF three target magnetron sputtering coater is a cost-effective vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Technical parameter

Supply Voltage 

  • VAC 220, 60Hz

UPS

 

  • 20KVA 16KW, 1 hour delay
  • 16 batteries, with capacity of 38AH

Vacuum Chamber

  • Dimension: Dia. 325 mm * H 385 mm
  • Material: 304 stainless steel
  • Viewport (Window): ~4'' (100mm) with shutter

Sample Stage

  • Top sample holder
  • Sample table: Dia. 150mm
  • Sample size: Max. 4'' diameter
  • Rotary speed: 0-40rpm adjustable
  • Heating temperature: up to 700oC

Water Chiller

  • Water flow rate: 2.3m3/h
  • Power: 3P
  • Cooling Capacity: 8250Kcal/h
  • Compressor output power: 2.25KW

Magnetron Sputtering Gun

  • 3× 2'' magnetron sputter guns, with automatic shutter
  • Sputtering orientation upwards
  • Target diameter: 2''
  • Magnets: rare earth magnet

RF Generator

  • 3 × RF 300W power supply with auto match
  • Power output range: 5W~300W
  • Maximum reflected power: 100W
  • Power stability: ±0.1%
  • Harmonic component: ≤-50dbc
  • Power supply: Single phase 187-253 VAC, 50/60HZ
  • Efficiency: ≥70%
  • Power factor: ≥90%
  • Reflected power (at maximum power): <3W
  • Maximum load current: 30ARMS
  • Maximum load voltage: 7500VRMS
  • RF output connector: 50 Ω, L29 or customized
  • Match time: 1~3s
  • Real part range of matched impedance: 0~80Ω
  • Imaginary part range of matched impedance:﹣200j~ ﹢200j
  • Cooling method: forced cooling

Mass Flow Meter

  • 3 × MFC mass flow control (Ar, O2 and N2)
  • Measuring ranges: up to 20sccm
  • With pneumatic isolation valve(s) and filter.

Full Automatic control by PC or PLC, to control

  • Store for minimum 100 recipe 
  • 19'' Flat controller

 


Product Image

laboratory vacuum PVD 3-target RF magnetron sputtering coater with UPS 1
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Send Inquiry to this Member

Zhengzhou CY Scientific Instrument

No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China

Phone:
+8637-371-55199322
Fax:
中国
Contact:
jibin wang (sales manager)
Mobile:
13837189935

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