| Model: | CY-MSP210S-RFDC |
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| Brand: | CYKY |
| Origin: | Made In China |
| Category: | Electronics & Electricity / Electronic Instrument / Laboratory Instrument |
| Label: | magnetron sputtering , DC sputtering , RF sputtering |
| Price: |
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| Min. Order: | 1 pc |
| Live Chat: | Last Online:17 Aug, 2020 |
CY-MSP210S-RFDC desktop dual-target magnetron sputtering coating instrument. The equipment has been miniaturized, while retaining the high-vacuum stainless steel cavity, while simplifying other mechanisms, limiting the shape of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a DC power supply and an RF power supply. The DC target can be used for sputtering of metals and other conductive materials. The RF power supply can be used for sputtering of various non-metals and metal oxides. The equipment vacuum system adopts all imported vacuum pumps, with fast pumping speed, high ultimate vacuum and excellent vacuum performance. The equipment has compact structure, perfect functions and easy to use. It is very suitable for various coating tests.
Technical parameter
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Desktop type double target magnetron sputtering coater |
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Sample stage
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Size:φ150mm;heating Up to 500℃;Rotating speed:0-20 adjustable |
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Magnetron sputtering target |
2” x2 dual targets share a baffle |
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Vacuum chamber |
Cavity size:φ210mm X 230mm Observation window:φ40mm Cavity material:SS304 stainless steel Opening method:Front door |
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Vacuum system |
Mechanical pump:Imported oil-free diaphragm pump Pumping interface:KF16 Molecular pump:Imported molecular pump Pumping interface:KF40 Vacuum measurement:Resistance gauge + ionization gauge Exhaust interface:KF16 Ultimate vacuum:1.0E-3Pa Power supply:AC 220V 50/60Hz Pumping rate:Oil-free pump 0.49L/s Molecular pump: 40L/S |
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Sputtering power |
DC power supply x1 RF power supply x1 Maximum output power DC power supply 500W RF power supply 500W |
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other |
Supply voltage:AC220V, 50Hz Overall size:550mm X 550mm X1100mm Total power:2kW |
