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Specifications

Magnetron sputtering / evaporation vacuum coating equipment

This equipment combined magnetron sputtering and vacuum evaporation techniques with in the same coating equipment, the only use of magnetron sputtering cathode glow discharge to the target atoms spill and partially ionized film deposited on the substrate, while can be used by resistance heating in a vacuum feed molten metal plating and allowed to vaporize and then deposited on the substrate film. Increased use of facilities and flexibility. The device apply to mobile phone case and other plastic the surface of metal, non-conductive film and the electromagnetic shielding film deposition.

The device configuration of the plasma processing equipment, high efficiency cathode magnetron sputtering cathode and resistance evaporation devices, designed to switch a large load of aircraft parts, using automatic control technology. The device is the fast deposition rate, high adhesion, delicate compact,high surface finish ,uniform consistency,machine coating process to achieve full automation,load capacity,reliable work,qualified high cost of production low,green earth. Mainly applied to computer shell, mobile phone shell, household appliances, etc., can be plated metal film, alloy film, composite film, transparent (translucent), non-conductive, electromagnetic shielding film.