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ITO sputtering target  1ITO sputtering target  2
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  • ITO sputtering target  2

ITO sputtering target

Model:-
Brand:YAM
Origin:Made In China
Category:Metallurgy , Mining & Energy / Metallurgy & Mining / Non-ferrous Metal Products
Label:sputtering target
Price: -
Min. Order:1 pc
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Member Information

Detail

Yiwei Advanced Materials Limited

Free MemberHong Kong S.A.R
Live Chat:Last Online:17 Jun, 2013

Product Description

ITO Target
/
Principal Uses
  Transparent conductive ITO film deposited by Magnetic Sputtering.
/
Physical Properties
   
 
Chemical Formula : In2O3/SnO2
Relative Density : >=99%
Crystal Particle Size : 5~15µm
Electrical Resistivity : 0.12m/·cm
Linear Thermal Expansion : 8.2×10-3K-1
Purity : >=99.99%
Appearance : Black Ceramic Piece
Impurity (unit: ppm) :
 Element Al Sb Cd Cu Fe Pb Ni Si Zn Ba
 Content (<=) 5 5 5 10 10 10 10 15 5 5
/
characterisation Methods
  Crystal Particle Size : Observed by SEM
Purity : Tested by ICP—AES means
Density : Tested by Archimedes Means

 

ITO sputtering target

The practical density is more than 7.05g/cm3 ,
the purity is more than 99.99% ,
the relative density is more than 99%.

The size which our company can meet is as following:
1) The plate sputtering target:
all size within 600*300mm*20mm
2) The cylinder sputtering target:
the diameter:  50-400mm
the thickness:  5-18mm
the height:  50-250mm.


Product Image

ITO sputtering target  1
Img 1
ITO sputtering target  2
Img 2

Send Inquiry to this Member

Yiwei Advanced Materials Limited

NO.55 QIDU ROAD,YANGLUO STREET,XINZHOU DISTRICT,WUHAN CITY,HUBEI PROVINCE,CHINA.

Phone:
0086-027-86966122
Fax:
0086-027-86981067
Contact:
Tao Wenhua (manager)
Mobile:
15827012892

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