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Wet Bench Application：
Developing Process
Etching Process
Stripping Process
Cleaning Process
Mask Cleaner
Suitable Size：2"-8" Wafer
Product Type：Wet Bench or Wet station
Operation Mode：Auto / Semi-Auto / Manual
Specialty：Build-to-order available
Available Option：
Class 100 or 1000
CIM Connect
Chemical Supply System
CO2 / IR
PLC / PC Base / PAC
Datalogic
Temperature Measurement Data Acquisition System
Product Feature：
Use quality pipe and valve component
Use PLC for electronic controller
Robotic horizontal and vertical stroke for high accuracy, stability and positioning
Quarantine zone for both acidic gas and electrical substance
Flexible disposition scheme for QDR
Modularized pipeline installment allows swift and convenient maintenance
Product design is highly adaptable to fit in customized environment according to the actual needs 

CSE’s batch wet process systems, wet stations and wet benches are designed for silicon etch, wafer cleaning, and wafer stripping for wafers from 100 mm up to 250 mm, and include fully automatic, semi-automatic and manual options, with a choice of linear and rotary robotics. We has a solution to meet most wet etching, wet process, parts cleaning and wafer cleaning needs.